Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[Image:section under construction.jpg|70px]] | [[Image:section under construction.jpg|70px]] | ||
*5206E 0.5µm 375nm | *5206E 0.5µm 375nm, dev SP30s | ||
Fast: 60mJ/cm<sup>2</sup>; defoc -6 (not optimized) | Fast: 60mJ/cm<sup>2</sup>; defoc -6 (1µm, not optimized) | ||
Quality: 60mJ/cm<sup>2</sup>; defoc -6 (not optimized) | |||
*5214E 1.5µm 405nm | Quality: 60mJ/cm<sup>2</sup>; defoc -6 (~750nm, not optimized) | ||
Fast: 90mJ/cm<sup>2</sup>; defoc -2 | *5214E 1.5µm 405nm, dev SP60s | ||
*5214E 1.5µm 375nm | Fast: 90mJ/cm<sup>2</sup>; defoc -2 (1-2µm) | ||
Fast: 65mJ/cm<sup>2</sup>; defoc 2 | *5214E 1.5µm 375nm, dev SP60s | ||
Quality: 65mJ/cm<sup>2</sup>; defoc 2 | Fast: 65mJ/cm<sup>2</sup>; defoc 2 (~1µm) | ||
*MiR 701 1.5µm 405nm ( | |||
*MiR 701 1.5µm 375nm ( | Quality: 65mJ/cm<sup>2</sup>; defoc 2 (~750nm) | ||
*nLOF 2020 2µm 375nm ( | *MiR 701 1.5µm 405nm, PEB 60s@110°C dev SP60s | ||
Fast: 200mJ/cm<sup>2</sup>; defoc -5 (~1µm, not optimized) | |||
*MiR 701 1.5µm 375nm, PEB 60s@110°C dev SP60s | |||
Fast: 170mJ/cm<sup>2</sup>; defoc -5 (1µm) | |||
Quality: 180mJ/cm<sup>2</sup>; defoc -6 (750nm) | |||
*nLOF 2020 2µm 375nm, PEB 60s@110°C dev SP60s | |||
Fast: 400mJ/cm<sup>2</sup>; defoc 5 (~1µm, not optimized) | |||
Quality: 400mJ/cm<sup>2</sup>; defoc 0 (1µm) | |||
*Substrate centering + flat alignment test | *Substrate centering + flat alignment test | ||