Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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*5206E 0.5µm 375nm (fast + quality) | *5206E 0.5µm 375nm (fast + quality) | ||
Fast: 60mJ/cm<sup>2</sup>; defoc -6 (not optimized) | |||
Quality: 60mJ/cm<sup>2</sup>; defoc -6 (not optimized) | |||
*5214E 1.5µm 405nm (fast) | *5214E 1.5µm 405nm (fast) | ||
*5214E 1.5µm 375nm (fast) | Fast: 90mJ/cm<sup>2</sup>; defoc -2 | ||
*5214E 1.5µm 375nm (fast + quality) | |||
Fast: 65mJ/cm<sup>2</sup>; defoc 2 | |||
Quality: 65mJ/cm<sup>2</sup>; defoc 2 | |||
*MiR 701 1.5µm 405nm (fast) | *MiR 701 1.5µm 405nm (fast) | ||
*MiR 701 1.5µm 375nm (fast + quality) | *MiR 701 1.5µm 375nm (fast + quality) | ||