Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Top Side Alignment== | ==Top Side Alignment== | ||
*4 marks (?nm) | *4 marks (?nm, probably low res camera) | ||
*Scaling (375nm) | *Scaling (375nm, high res camera) | ||
==Back Side Alignment== | ==Back Side Alignment== | ||
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==Advanced Field alignment== | ==Advanced Field alignment== | ||
*4 marks, 25 fields (375nm, high res camera) | |||
*Scaling, 10 fields (375nm, high res camera) | |||