Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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[[Image:section under construction.jpg|70px]] | [[Image:section under construction.jpg|70px]] | ||
*5206E 0.5µm 375nm (fast + quality) | |||
*5214E 1.5µm 405nm (fast) | |||
*5214E 1.5µm 375nm (fast) | |||
*MiR 701 1.5µm 405nm (fast) | |||
*MiR 701 1.5µm 375nm (fast + quality) | |||
*nLOF 2020 2µm 375nm (fast + quality) | |||
==Exposure dose== | ==Exposure dose== | ||