Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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*Speed vs. dose (375nm) | *Speed vs. dose (375nm) | ||
*Speed vs. area (375nm) | *Speed vs. area (375nm) | ||
**Online | |||
**Offline | |||
==Resolution== | ==Resolution== | ||
Revision as of 10:08, 19 March 2019
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Exposure technology
Process Parameters
Exposure dose
Defocus
Writing speed
- Speed vs. dose (375nm)
- Speed vs. area (375nm)
- Online
- Offline
Resolution
Substrate centring
During (4") substrate detection, the sample is scanned along the X- and Y-axes, as well as diagonally. From these measurements, the diameter of the substrate is calculated, as well as the stage position matching the center of the substrate. This stage position will be the default origin for the subsequent exposure.
Flat alignment
At the end of (4") substrate detection, the sample is scanned twice along the flat, in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat.
Alignment