Specific Process Knowledge/Doping: Difference between revisions
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== Doping your wafer == | == Doping your wafer == | ||
This page is about doping your wafer or making a thin film layer doped with boron, | This page is about doping your wafer or making a thin film layer doped with boron, phosphorus or germanium. The links below direct you to various doping results achieved by the use of different processes and heat treatments. | ||
*[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Doping with Phosphorous using high temperature furnaces]] - Doping silicon wafers with | *[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Doping with Phosphorous using high temperature furnaces]] - Doping silicon wafers with phosphorus by thermal pre-deposition and drive-in | ||
*[[Specific Process Knowledge/Thermal Process/Dope with Boron|Doping with Boron using high temperature furnaces]] - Doping silicon wafers with boron by thermal pre-deposition and drive-in | *[[Specific Process Knowledge/Thermal Process/Dope with Boron|Doping with Boron using high temperature furnaces]] - Doping silicon wafers with boron by thermal pre-deposition and drive-in | ||
*[[Specific Process Knowledge/Thermal Process/Oxide mask|Oxide mask thickness]] - Required oxide mask thickness for pre deposition and diffusion | *[[Specific Process Knowledge/Thermal Process/Oxide mask|Oxide mask thickness]] - Required oxide mask thickness for pre deposition and diffusion | ||
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si|Doping using LPCVD PolySilicon Furnaces]] - Deposition of Poly-Si or amorphous Si doped with boron or | *[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si|Doping using LPCVD PolySilicon Furnaces]] - Deposition of Poly-Si or amorphous Si doped with boron or phosphorus | ||
*[[Specific Process Knowledge/Thin film deposition/PECVD/Doping|Doping using PECVD]] - Making boron glass (BSG), phosphorous glass (PSG) or boron- | *[[Specific Process Knowledge/Thin film deposition/PECVD/Doping|Doping using PECVD]] - Making boron glass (BSG), phosphorous glass (PSG) or boron-phosphorus glass (PBSG) | ||
*Ion implantation (not possible at Danchip) | *Ion implantation (not possible at Danchip) | ||