Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong: Difference between revisions
Appearance
No edit summary |
|||
| Line 328: | Line 328: | ||
|}<p class=MsoNormal><span lang=DA> </span></p> | |}<p class=MsoNormal><span lang=DA> </span></p> | ||
=With CF4 and H2 chemistry= | =With CF4 and H2 chemistry by ''Peixiong@nanolab''= | ||
==Part 1== | ==Part 1== | ||