Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
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'''Feedback to this page''': '''[mailto:plasma@ | '''Feedback to this page''': '''[mailto:plasma@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/Chromium click here]''' | ||
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===Chromium etch in ICP metal on a thick glass substrate=== | ===Chromium etch in ICP metal on a thick glass substrate=== | ||
The Chromium etch has ONLY been carried out on the following substrate stack: | The Chromium etch has ONLY been carried out on the following substrate stack: | ||
The Chromium is sputter deposited onto a 2" quartz wafer and | The Chromium is sputter deposited onto a 2" quartz wafer and patterned by e-beam with Zep520A resist. | ||
This 2" QZ wafer is bonded with crystal bond to a 65mmx65mm quartz plate with the thickness: 6.35mm. | This 2" QZ wafer is bonded with crystal bond to a 65mmx65mm quartz plate with the thickness: 6.35mm. | ||
This QZ plate is bonded to a Si wafer. | This QZ plate is bonded to a Si wafer. | ||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | {| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | ||
|+ '''Cr etch''' by bghe@ | |+ '''Cr etch''' by bghe@nanolab | ||
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! Parameter | ! Parameter | ||