Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
No edit summary |
No edit summary |
||
Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:plasma@ | '''Feedback to this page''': '''[mailto:plasma@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/Chromium click here]''' | ||
Line 47: | Line 47: | ||
===Chromium etch in ICP metal on a thick glass substrate=== | ===Chromium etch in ICP metal on a thick glass substrate=== | ||
The Chromium etch has ONLY been carried out on the following substrate stack: | The Chromium etch has ONLY been carried out on the following substrate stack: | ||
The Chromium is sputter deposited onto a 2" quartz wafer and | The Chromium is sputter deposited onto a 2" quartz wafer and patterned by e-beam with Zep520A resist. | ||
This 2" QZ wafer is bonded with crystal bond to a 65mmx65mm quartz plate with the thickness: 6.35mm. | This 2" QZ wafer is bonded with crystal bond to a 65mmx65mm quartz plate with the thickness: 6.35mm. | ||
This QZ plate is bonded to a Si wafer. | This QZ plate is bonded to a Si wafer. | ||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | {| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | ||
|+ '''Cr etch''' by bghe@ | |+ '''Cr etch''' by bghe@nanolab | ||
|- | |- | ||
! Parameter | ! Parameter |
Revision as of 17:08, 25 November 2019
Feedback to this page: click here
Chromium etch in ICP metal - small substrate using carrier
The Chromium etch was carried out on the following substrate stack: 2" Si wafer with Cr laying in a 6" Si wafer with a 4" recess. The area outside the recess was covered by AZ resist. The work was carried out be Erol Zekovic @Nanotech and BGHE@nanolab
Parameter | Cr etch |
---|---|
Cl2 (sccm) | 65 |
O2 (sccm) | 15 |
Pressure (mTorr) | 15 |
Coil power (W) | 300 |
Platen power (W) | 15 |
Temperature (oC) | 50 |
Spacers (mm) | 100 |
Etch rate (nm/min) | ~32 (Date: 2014-08-13) |
Zep520A resist selectivity | NA |
Comment | Was masked by capton tape |
Chromium etch in ICP metal on a thick glass substrate
The Chromium etch has ONLY been carried out on the following substrate stack: The Chromium is sputter deposited onto a 2" quartz wafer and patterned by e-beam with Zep520A resist. This 2" QZ wafer is bonded with crystal bond to a 65mmx65mm quartz plate with the thickness: 6.35mm. This QZ plate is bonded to a Si wafer.
Parameter | Cr etch |
---|---|
Cl2 (sccm) | 65 |
O2 (sccm) | 15 |
Pressure (mTorr) | 15 |
Coil power (W) | 300 |
Platen power (W) | 15 |
Temperature (oC) | 50 (no back side cooling) |
Spacers (mm) | 100 |
Etch rate (nm/min) | ~14 |
Zep520A resist selectivity | ~0.9 |
Comment | . |