Specific Process Knowledge/Thin film deposition/Deposition of Zinc: Difference between revisions
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It is important not to use too high power as this will give a very fast increase in the deposition rate once the evaporation is started. For new Zn pellets, an oxide removal run is recommended before the actual deposition. The max power needs to bel slightly adjusted for this run (slightly higher than for already-melted pellets). | It is important not to use too high power as this will give a very fast increase in the deposition rate once the evaporation is started. For new Zn pellets, an oxide removal run is recommended before the actual deposition. The max power needs to bel slightly adjusted for this run (slightly higher than for already-melted pellets). | ||
Frequently exchange the QCM crystal (quartz crystal monitor) which is used to measure the thickness of the deposited film. After about 1 micron accumulated deposition, the crystal severely underestimated the thickness, whereas a fresh sensor measured accurately (film thickness verified with Dektak profilometry). | Frequently exchange the QCM crystal (quartz crystal monitor) which is used to measure the thickness of the deposited film. After about 1 micron accumulated deposition, the crystal severely underestimated the thickness, whereas a fresh sensor measured accurately (film thickness verified with Dektak profilometry). | ||
[[File:Zn dep rates.png|400px|right|thumb|The quartz crystal monitor at the back of the machine, which should be exchanged frequently.]] | |||