LabAdviser/Technology Research/Technology Development of 3D Silicon Plasma Etching process for Novel Devices and Applications

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Technology Development of 3D Silicon Plasma Etching process for Novel Devices and Applications

• Project type: Ph.d. project
• Project responsible: Bingdong Chang
• Supervisors:Henri Jansen, Flemming Jensen, Jörg Hübner
• Partners involved: DTU Danchip

Publications in peer-reviewed journal papers

Publications as first author

• DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process

Chang, B., Leussink, P., Jensen, F., Hübner, J. and Jansen, H.,

Microelectronic Engineering, 191, pp.77-83 (2018) DOI

• DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro-and nanostructures by a modified Bosch etch process

Chang, B., Jensen, F., Hübner, J. and Jansen, H

Journal of Micromechanics and Microengineering, 28(10), p.105012 (2018) DOI

• Confined Growth of ZIF‐8 Nanocrystals with Tunable Structural Colors

Chang, B., Yang, Y., Jansen, H., Ding, F., Mølhave, K. and Sun, H.

Advanced Materials Interfaces, 5(9), p.1701270 (2018) DOI

• Highly Ordered 3D Silicon Micro‐Mesh Structures Integrated with Nanowire Arrays: A Multifunctional Platform for Photodegradation, Photocurrent Generation, and Materials Conversion

Chang, B., Tang, Y., Liang, M., Jansen, H., Jensen, F., Wang, B., Mølhave, K., Hübner, J. and Sun, H.

ChemNanoMat (2018) DOI

• Large Area Three- Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects

Chang, B., Zhou, C., Tarekegne, A., Yang, Y., Zhao, D., Jensen, F., Hübner, J., Jansen, H.

Advanced Optical Materials (2018) DOI

Publications as co-author

• Inductively coupled plasma nanoetching of atomic layer deposition alumina

Han, A., Chang, B., Todeschini, M., Le, H. T., Tiddi, W., and Keil, M.

Microelectronic Engineering (2018) DOI

Conference contributions

• RIE-lag “Correction” and Infinite Etching Selectivity with Conventional Photoresist in a Bosch Process

Chang, B., Leussink, P., Jensen, F., Hübner, J. and Jansen, H.

Poster presentation at 43rd International conference on Micro and Nano Engineering, Braga, Portugal (2017)

• Three dimensional engineering of silicon micro- and nanostructures

Chang, B., Jensen, F., Hübner, J. and Jansen, H.

Oral presentation at 44rd International conference on Micro and Nano Engineering, Copenhagen, Denmark (2018)

Student projects

• High Resolution Pattern Definition with Electron Beam Lithography

Mikro 3W, course no. 33470 (June 2016)

• Precise Timing Control in Deep Reactive Ion Etching (DRIE) with Bosch Process

Mikro 3W, course no. 33470 (January 2017)

• Using the Black Silicon Method to Monitor the Reproducibility of Plasma Etching Processes

Mikro 3W, course no. 33470 (July 2017)