Specific Process Knowledge/Back-end processing/Polisher CMP: Difference between revisions
| Line 89: | Line 89: | ||
*one 2" wafer | *one 2" wafer | ||
*one 100 mm wafer | *one 100 mm wafer | ||
*one | *one 150 mm wafer | ||
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*<nowiki>#</nowiki> small samples | *<nowiki>#</nowiki> small samples | ||