Specific Process Knowledge/Thin film deposition/Deposition of Zinc: Difference between revisions
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===XPS of Al films to detect Zn=== | ===XPS of Al films to detect Zn=== | ||
''Measurements made in June/July 2018.'' | |||
XPS was done at Danchip with 50 eV and 50 ms dwell per scan. The number of scans per element varied as shown below in the figure captions. We can clearly see that the Zn amount in the Al film decreased and became indetectable after cleaning the chamber. Of course we cannot guarantee that there is no Zn contamination at all, since there is a detection limit for the XPS even with many scans per level. | XPS was done at Danchip with 50 eV and 50 ms dwell per scan. The number of scans per element varied as shown below in the figure captions. We can clearly see that the Zn amount in the Al film decreased and became indetectable after cleaning the chamber. Of course we cannot guarantee that there is no Zn contamination at all, since there is a detection limit for the XPS even with many scans per level. | ||