Specific Process Knowledge/Etch/DryEtchProcessing/Comparison: Difference between revisions
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! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/III-V RIE |III-V RIE ]] | ! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/III-V RIE |III-V RIE ]] | ||
! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/III-V ICP|III-V ICP]] | ! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/III-V ICP|III-V ICP]] | ||
! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/|IBE | ! style="background:silver; color:black" rowspan="2" | [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] | ||
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! style="background:silver; color:black"| [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-1|Pegasus 1]] | ! style="background:silver; color:black"| [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-1|Pegasus 1]] | ||