Specific Process Knowledge/Characterization: Difference between revisions
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| width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/Optical_characterization#Filmtek_4000|Filmtek (reflec- tometer)]]''' | | width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/Optical_characterization#Filmtek_4000|Filmtek (reflec- tometer)]]''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/Optical_characterization#Ellipsometer|Ellip- someter]]''' | | width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/Optical_characterization#Ellipsometer|Ellip- someter]]''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''Thickness stylus''' | | width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/Thickness_Measurer|Thickness stylus]]''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''XPS''' | | width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/XPS#XPS-ThermoScientific|XPS]]''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''PL mapper''' | | width="50" align="center" style="background:#f0f0f0;"|'''PL mapper''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''4-point probe''' | | width="50" align="center" style="background:#f0f0f0;"|'''4-point probe''' | ||