Specific Process Knowledge/Characterization: Difference between revisions

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*[[/DSC Perkin Elmer|DSC Perkin Elmer]]
*[[/DSC Perkin Elmer|DSC Perkin Elmer]]
*[[/Probe station|Probe station]]
*[[/Probe station|Probe station]]
 
*[[/Hardness measurement|Hardness tester]]
*[[/KLA-Tencor Surfscan 6420|KLA-Tencor Surfscan 6420]]
*[[/KLA-Tencor Surfscan 6420|KLA-Tencor Surfscan 6420]]
*[[/III-V ECV-profiler|III-V ECV-profiler (Electrochemical Capacitance-Voltage carrier density profiler)]]
*[[/III-V ECV-profiler|III-V ECV-profiler (Electrochemical Capacitance-Voltage carrier density profiler)]]
*[[/X-Ray Diffractometer|X-Ray Diffractometer ]]
*[[/X-Ray Diffractometer|X-Ray Diffractometer ]]
*[[/XRD|XRD SmartLab]]
*[[/XRD|XRD SmartLab]]

Revision as of 14:42, 22 October 2018

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Overview of characteristics and where to measure it

Optical Micro- scopes SEM (incl. EDX) AFM Stylus profiler Optical profiler Filmtek (reflec- tometer) Ellip- someter Thickness stylus XPS PL mapper 4-point probe Probe station XRD Life time scanner Drop shape analyser Hardness tester Differential Scanning Calorimeter DSC Surfscan
Thin film thickness x 1) x 1) x 2) x 2) x x x x 5) x 3) x
Defects x x
Wafer thickness x 1) x 1) x
Step coverage x 1) x 1)
Particles x x x x
Element analysis x x x 4) x 4)
Surface roughness x x x
Deposition uniformity x x x
Film stress x x
Refractive index x x
Reflectivity x x (x)
Resistivity x
Breakdown voltage
Electrical conductivity x
Thermal conductivity
Optical gap x x
Crystalinity x x
Charge carrier life time x
Contact angle hydrophobic/hydrophillic x
Material Hardness x
Voids in wafer bonding x
Phase changes x
  1. Using the cross section method
  2. Using the create step method
  3. With known resistivity
  4. Composition information for crystalline materials
  5. Only single layer

Choose characterization topic

Choose equipment

AFM

Element analysis

Optical and stylus profilers

Optical microscopes

Optical characterization


SEMs at CEN

SEMs at Danchip

TEMs at CEN

Various