Specific Process Knowledge/Characterization/XPS/Processing/Guidelines: Difference between revisions
Created page with "= Data processing guidelines in Avantage = ; Use one processing grid to hold all spectra to be fitted. : Each processing grid has a peak table that holds all the peaks for e..." |
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; Do not mix snapshot and scanned spectra in processing grid | ; Do not mix snapshot and scanned spectra in processing grid | ||
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; Rename depth profiles | |||
: Sometimes when you analyse depth profiles, the information on the ion gun parameters are hard to find. This is why renaming the 'Depth profile' to something like '2keVHigh20secs' when setting up the experiment is useful. In this way you will always know that the ion was etching for 20 seconds at 2 keV energy and with high current setting . | |||