Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Niobium: Difference between revisions

Reet (talk | contribs)
Reet (talk | contribs)
Line 78: Line 78:
  |-style="background:WhiteSmoke; color:black"
  |-style="background:WhiteSmoke; color:black"
! Comment
! Comment
| Substrates will get heated during a longer deposition. During a 100 nm deposition at 2 Å/s, the substrate reached about 105 °C.
| Substrates get heated during the deposition.  
For 100 nm Nb at 2 Å/s, the substrate reached about 105 °C.
|
|
|}
|}