Revision as of 07:23, 1 October 2018

Feedback to this page: click here

XPS data processing

You will need some kind of dedicated software in order to analyze and interpret XPS spectra. You can find many online but here we will only use the Avantage for obvious reasons. Installing it on your own PC is strongly adviced as the analysis may be time consuming.

Install Avantage

To install Avantage, please download the latest version (by July 2018 no. 5.988, a 202 Mb zip file) from the internet:

The internet

or copy the most recently downloaded version from the network locations:

Cleanroom drive: O:\CleanroomDrive\XPS\5.988\install5988.zip
University drive: U:\DCH\CleanroomDrive\XPS\5.988\install5988.zip

Run the install file. At some point a nine digit computer number (for your installation) will be given and you will be prompted for a processing licence. To get a license, write an email to Thermo ( SA-Support.SID.Europe@thermofisher.com or click here) requesting a standard processing license. You will also have to provide the System ID KA1002 for our instrument. Usually you will have an answer within a day or two. Use the license to activate Avantage and you are ready to analyze your data.

How to analyze data

In this section, all steps (import data, add peaks and backgrounds etc.) of the analysis are described.

XPS Knowledge View

A knowledge database providing specific information on every element is included in the software. It provides very useful information about the XPS characteristics of every detectable element and it may even be a very good idea to consult it before the data is acquired. Click HERE to get information on how to access XPS Knowledge View in Avantage.

Basic instructions

Click HERE to have a complete walk-through of an example. This includes

Open data file
Open and analyze survey spectrum
Analyze high resolution spectra of the individual spectra:
- Add background
- Add peaks
- Quantify
Analyze depth profiles

Examples of data analysis

Depth profile of a silicon wafer with nitride, polysilicon and oxide layer

Depth profile of ALD layers: Silicon wafer with 15 nm Al₂O₃, 15 nm of TiO₂ and 16 nm of Hf_O

Periodic table with binding energies of all elements

Specific Process Knowledge/Characterization/XPS/Processing/PeriodicTable

@@ Line 38: / Line 38: @@
 *[[Specific Process Knowledge/Characterization/XPS/Processing/SiliconSandwich|Depth profile of a silicon wafer with nitride, polysilicon and oxide layer]]
+*[[Specific Process Knowledge/Characterization/XPS/Processing/ALDSandwich1|Depth profile of ALD layers: Silicon wafer with 15 nm Al<sub>2</sub>O<sub>3</sub>, 15 nm of TiO<sub>2</sub> and 16 nm of Hf<sub>O</sub> ]]
 == Periodic table with binding energies of all elements==
 *[[Specific Process Knowledge/Characterization/XPS/Processing/PeriodicTable]]