Specific Process Knowledge/Thin film deposition/Deposition of Zinc: Difference between revisions
| Line 15: | Line 15: | ||
===XPS of Al films to detect Zn=== | ===XPS of Al films to detect Zn=== | ||
XPS was done here at Danchip with 50 eV and 50 ms dwell per scan. The number of scans per element varied as shown below in the figure captions. We can clearly see that the Zn amount in the Al film | XPS was done here at Danchip with 50 eV and 50 ms dwell per scan. The number of scans per element varied as shown below in the figure captions. We can clearly see that the Zn amount in the Al film decreased and became indetectable after cleaning the chamber. Of course we cannot guarantee that there was no Zn present at all, since there is a detection limit for the XPS even with many scans per level. | ||
[[File:Al w Zn from 20-06-2018.png|400px|left|thumb|XPS of Al film made before chamber was cleaned after Zn deposition. 10 scans per level. Zn peaks are obvious.]] | [[File:Al w Zn from 20-06-2018.png|400px|left|thumb|XPS of Al film made before chamber was cleaned after Zn deposition. 10 scans per level. Zn peaks are obvious.]] | ||