Specific Process Knowledge/Thin film deposition/Temescal/Acceptance Test: Difference between revisions
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==Side wall deposition on tilted samples == | ==Side wall deposition on tilted samples == | ||
The tilted sample holder was tested with 10 nm Ti/100 nm Au deposition at approx. 27 °, 45 °, and 53 ° to the normal (53 ° is the max tilt variation for a 6" sample holder - we now have a smaller 2" sample holder that can tilt all the way to perpendicular to the evaporation source). | The tilted sample holder was tested with 10 nm Ti/100 nm Au deposition at approx. 27 °, 45 °, and 53 ° to the normal (53 ° is the max tilt variation for a 6" sample holder - we now have a smaller 2" sample holder that can tilt all the way to perpendicular to the evaporation source). | ||
As expected, the side wall deposition was thicker for 53 ° tilt than for 17 ° tilt. | As expected, the side wall deposition was thicker for 53 ° tilt than for 17 ° tilt. | ||
[[File:tilt27_sample1-_01.jpg|400px|thumb|left|Side wall deposition of Ti/Au on Si and nLOF resist | [[File:tilt27_sample1-_01.jpg|400px|thumb|left|17 ° tilt: Side wall deposition of Ti/Au on Si and nLOF resist.]] | ||
[[File:tilt53_sample2_01.jpg|400px|thumb|right|Side wall deposition of Ti/Au on Si and nLOF resist | [[File:tilt53_sample2_01.jpg|400px|thumb|right|53 ° tilt: Side wall deposition of Ti/Au on Si and nLOF resist.]] | ||