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==Acceptance test and test results==
==Acceptance test and test results==


Topics:
In the acceptance test, we tested the vacuum performance, the ion source, and the uniformity of the deposited metal films.
*Vacuum performance
*Ion beam etching of SiO2
*E-beam testing: Ti/Au and Ti/Ni deposition


The uniformity of the ion beam etch was tested on Si wafers with SiO2 coating of a known thickness.
The uniformity of the ion beam etch was tested on Si wafers with SiO2 coating of a known thickness.
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Side wall coverage was evaluated in SEM for Ti/Au films deposited at normal incidence (what most users require, which gives no side-wall deposition) and with various degrees of tilt.
Side wall coverage was evaluated in SEM for Ti/Au films deposited at normal incidence (what most users require, which gives no side-wall deposition) and with various degrees of tilt.


Full acceptance test report here:  
'''Full acceptance test report here:'''


[[:File:Temescal Acceptance Test Results Mar-April-May 2018.pdf]]
[[:File:Temescal Acceptance Test Results Mar-April-May 2018.pdf]]
= Vacuum performance =
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