Specific Process Knowledge/Thin film deposition/Temescal/Acceptance Test: Difference between revisions
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For metal films, the thickness and for Ti/Ni the sheet resistance uniformity were measured. Furthermore the side wall coverage was evaluated in SEM for Ti/Au films deposited at normal incidence (what most users require, which gives no side-wall deposition) and with various degrees of tilt. | For metal films, the thickness and for Ti/Ni the sheet resistance uniformity were measured. Furthermore the side wall coverage was evaluated in SEM for Ti/Au films deposited at normal incidence (what most users require, which gives no side-wall deposition) and with various degrees of tilt. | ||
Full acceptance test report here: [[:File:Temescal Acceptance Test Results Mar-April-May 2018.pdf]] | Full acceptance test report here: | ||
[[:File:Temescal Acceptance Test Results Mar-April-May 2018.pdf]] | |||