Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum: Difference between revisions

← Older editNewer edit →
VisualWikitext
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Line 15: Line 15:
! General description
! General description
| E-beam deposition of Mo  
| E-beam deposition of Mo  
| Sputter deposition of Mo  
(line-of-sight deposition)
| Sputter deposition of Mo
(not line-of-sight)
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Molybdenum"