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Specific Process Knowledge/Wafer cleaning/Cleaning with Soap Sonic: Difference between revisions

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==Cleaning of samples that have been out of the cleanroom==  
==Cleaning of samples that have been out of the cleanroom==  
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The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a nonionic detergent which is metal ion free. This detergent is added to reduce surface tension and thus help removing particles from the samples to be cleaned.
The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a nonionic detergent which is metal ion free. This detergent is added to reduce surface tension and thus help removing particles from the samples to be cleaned.


It is used for samples (typical wafers or chips) that have been out of the cleanroom e.g. if they have been diced, and you want to bring them in again for measurement or further processing. In most cases the Triton X-100 sonic clean is not enough. The samples will also have to be cleaned in a [http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha piranha] solution. You must always ask DTU Danchip for permission to bring your samples back into the cleanroom once they have been out of the cleanroom.
It is used for samples (typical wafers or chips) that have been out of the cleanroom e.g. if they have been diced, and you want to bring them in again for measurement or further processing. In most cases the Triton X-100 sonic clean is not enough. The samples will also have to be cleaned in a [http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha piranha] solution. You must always ask DTU Nanolab for permission to bring your samples back into the cleanroom once they have been out of the cleanroom.


===Procedure===
===Procedure===
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*Remove samples and dry them
*Remove samples and dry them
*Dump the Triton X-100 solution and rinse baths to drain. Rinse tanks with DI water. Leave dump valves open so the baths drain completely
*Dump the Triton X-100 solution and rinse baths to drain. Rinse tanks with DI water. Leave dump valves open so the baths drain completely
*Continue with [http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha piranha].
*Continue with [http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha piranha].