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Specific Process Knowledge/Thin film deposition/Deposition of Gold/Adhesion layers: Difference between revisions

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Ti does not inter-diffuse with Au at room temperature, supported by the ''µ''4PP measurements which show that the electrical properties appear to be similar to pure Au thin-films. The formation of a stable Ti layer under the Au prevents diffusion of Au into the underlying substrate and improves the performance-time and temperature stability of the devices. The Ti-Au inter-diffusion starts at temperatures higher than 175°C. If the devices have to be used for prolonged time above this temperature, Pd and Pt diffusion barriers must be used. Comparative studies show a localized surface plasmon damping in plasmonic nanostructures due to the presence of a very thin adhesion layer, and overall better performances of Ti over Cr for the optical resonance of such nanostructures.
Ti does not inter-diffuse with Au at room temperature, supported by the ''µ''4PP measurements which show that the electrical properties appear to be similar to pure Au thin-films. The formation of a stable Ti layer under the Au prevents diffusion of Au into the underlying substrate and improves the performance-time and temperature stability of the devices. The Ti-Au inter-diffusion starts at temperatures higher than 175°C. If the devices have to be used for prolonged time above this temperature, Pd and Pt diffusion barriers must be used. Comparative studies show a localized surface plasmon damping in plasmonic nanostructures due to the presence of a very thin adhesion layer, and overall better performances of Ti over Cr for the optical resonance of such nanostructures.


Therefore, if the choice is limited to metallic adhesion layers, Ti is preferred over Cr for nano-optics applications. A perhaps even better alternative is to use organosilane-based adhesion layers. Comparative measurements of Ti vs Mercaptopropyltrimethoxysilane (MPTMS) and Cr vs Aminopropyltrimethoxysilane (APTMS) show overall better performances for the organosilane-based adhesion layers over the metallic ones. A considerable disadvantage of these molecular adhesion layers is their lack of compatibility with the lithographic and lift-off processes, which still play an important role in the fabrication of nanostructures.
Therefore, if the choice is limited to metallic adhesion layers, '''Ti is preferred over Cr for nano-optics applications'''. A perhaps even better alternative is to use organosilane-based adhesion layers. Comparative measurements of Ti vs Mercaptopropyltrimethoxysilane (MPTMS) and Cr vs Aminopropyltrimethoxysilane (APTMS) show overall better performances for the organosilane-based adhesion layers over the metallic ones. A considerable disadvantage of these molecular adhesion layers is their lack of compatibility with the lithographic and lift-off processes, which still play an important role in the fabrication of nanostructures.


== Nano-electronic devices ==
== Nano-electronic devices ==