Specific Process Knowledge/Thin film deposition/Deposition of Nickel: Difference between revisions

Revision as of 15:50, 8 August 2018 view source Reet (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 1,760 edits →Nickel deposition: removed Alcatel, added Temescal ← Older edit		Revision as of 11:55, 11 September 2018 view source Choi (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, danchip 641 edits →Nickel deposition Newer edit →
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	'''*''' ''To deposit layers thicker ~~then~~ 600 ~~microns~~ permission is required from metal@danchip.dtu.dk to ensure enough material is present in the machine''		'''*''' ''To deposit layers thicker than 600 nanometers permission is required from metal@danchip.dtu.dk to ensure enough material is present in the machine''