Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum: Difference between revisions

← Older editNewer edit →
VisualWikitext
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
→Molybdenum deposition: Took out Alcatel, added Temescal
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Line 68: Line 68:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
! Comment
! Comment
| As of August 2018, Mo has not yet been deposited in the Temescal. Contact the Thin Film group to develop a process.
| As of August 2018, Mo has not yet been deposited in the Temescal.  
Please contact the Thin Film group to develop a process.
|
|
|-
|-
Line 75: Line 76:




'''*'''  ''For thicknesses above 600 nm permission from ThinFilm group (thinfilm@danchip.dtu.dk) is required to ensure enough material is present.''
'''*'''  ''If depositing more than 600 nm in total, write to metal@danchip.dtu.dk well in advance to ensure enough material is present.''
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Molybdenum"