Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
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* usually room temp | * usually room temp | ||
* Sample can be heated to more than 400°C | * Sample can be heated to more than 400°C * | ||
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|style="background:LightGrey; color:black"|Process pressure | |style="background:LightGrey; color:black"|Process pressure | ||
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''*'' For temperatures above 400°C, please contact thinfilm@danchip.dtu.dk, as higher temperatures may damage the machine. | |||
==Film quality optimization== | ==Film quality optimization== | ||