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Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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In the table below ([[#Relative Sputter rates |Relative Sputter rates]]) there is a list of relative sputter rates for different materials (Al is set to 1).
In the table below ([[#Relative Sputter rates |Relative Sputter rates]]) there is a list of relative sputter rates for different materials (Al is set to 1).
This means that You can estimate the sputter rate for a new material if you have the rate for another material under the same conditions.
This means that you can estimate the sputter rate for a new material if you have the rate for another material under the same conditions (may only work for non-reactive sputtering, i.e., with Ar as the gas).
I think this only works for non-reactive sputtering (i.e. with Ar as the gas).


====Thickness uniformity====
====Thickness uniformity====
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