Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4: Difference between revisions

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'''Feedback to this page:  
'''Feedback to this page:  
[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus click here]'''
[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-4 click here]'''
[[Category: Equipment |Etch DRIE]]
[[Category: Equipment |Etch DRIE]]
[[Category: Etch (Dry) Equipment|DRIE]]
[[Category: Etch (Dry) Equipment|DRIE]]


 
==Pegasus 4 - 150mm Silicon oxide and silicon nitride etching==


'''The tool is currently being installed - we hope that it will be available by early 2019.
'''The tool is currently being installed - we hope that it will be available by early 2019.

Revision as of 07:52, 24 June 2019

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Pegasus 4 - 150mm Silicon oxide and silicon nitride etching

The tool is currently being installed - we hope that it will be available by early 2019.


The twin Pegasi (3 and 4) have just been rolled into the lab on July 3rd 2018.
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