Specific Process Knowledge/Characterization/XRD: Difference between revisions
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Sample stage | Sample stage | ||
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χ:-5~+95° | *χ:-5~+95° | ||
φ:0~360° | *φ:0~360° | ||
Z:-4~+1 mm | *Z:-4~+1 mm | ||
X,Y:±50 mm for a 100 mm wafer | *X,Y:±50 mm for a 100 mm wafer | ||
Rx,Ry:-5~+5° | *Rx,Ry:-5~+5° | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||