Specific Process Knowledge/Characterization/XRD: Difference between revisions
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χ:-5~+95°<br> | χ:-5~+95°<br> | ||
φ:0~360° | φ:0~360°<br> | ||
Z:-4~+1 mm | Z:-4~+1 mm<br> | ||
X,Y:±50 mm for a 100 mm wafer | X,Y:±50 mm for a 100 mm wafer<br> | ||
Rx,Ry:-5~+5° | Rx,Ry:-5~+5° | ||
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