Jump to content

Specific Process Knowledge/Characterization/XRD: Difference between revisions

← Older editNewer edit →
VisualWikitext
Khara (talk | contribs)
DCH-Employees-701, NLAB-LabmanagerAllUsers
277 edits
Khara (talk | contribs)
DCH-Employees-701, NLAB-LabmanagerAllUsers
277 edits
Line 69: Line 69:
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<nowiki>#</nowiki> small samples
up to 150 mm wafers
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/XRD"