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The electrical resistivity of metallic bulk and thin-film samples is usually measured by the 4-point probe technique. The classic arrangement, visible in Fig. 1, consists of four needle-like electrodes in a linear arrangement, with a current injected into the material via the outer two electrodes, while the resulting difference in electric potential is measured via the two inner electrodes.
The electrical resistivity of metallic bulk and thin-film samples is usually measured by the 4-point probe technique. The classic arrangement, visible in Fig. 1, consists of four needle-like electrodes in a linear arrangement, with a current injected into the material via the outer two electrodes, while the resulting difference in electric potential is measured via the two inner electrodes.


[[File:2.png|300px|center|Fig. 1. Schematic representation of the "thin-film structure-property causality" approach for the fabrication of thin-films. The study of the interaction between thin-films is added as fundamental step in the process.]]
[[File:2.png|300px|center|Fig. 1. 4-point probe setup. The current is supplied by the outer connections, the voltage drop is measured between the inner connections.]]




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