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Specific Process Knowledge/Thin film deposition/Temescal: Difference between revisions

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→Process information: Added materials and links
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== Process information ==
== Process information ==


Link to process pages - e.g. one page for each material
====Materials for e-beam evaporation====


Example:
*[[Specific Process Knowledge/Thin film deposition/Deposition of Aluminium|Aluminium (Al)]]
*[[Specific Process Knowledge/Etch/Etching of Silicon/Si etch using RIE1 or RIE2|Etch of silicon using RIE]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Chromium|Chromium (Cr)]]
*[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2|Etch of silicon oxide using RIE]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Copper|Copper (Cu)]]
*[[Specific Process Knowledge/Etch/Etching of Silicon Nitride/Etch of Silicon Nitride using RIE|Etch of silicon nitride using RIE]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Gold|Gold (Au)]]
*[[Specific Process Knowledge/Etch/Etching of Polymer/Etch of Photo Resist using RIE|Etch of photo resist using RIE]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum|Molybdenum (Mo)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Nickel|Nickel (Ni)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Palladium|Palladium (Pd)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Platinum|Platinum (Pt)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silver|Silver (Ag)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Tantalum|Tantalum (Ta)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Tin|Tin (Sn)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium|Titanium (Ti)]] 
*[[Specific Process Knowledge/Thin film deposition/Deposition of Tungsten|Tungsten (W)]] - thinner layers
 
Note that to date (July 2018) we have processes available for deposition of Al, Cr, Au, Ni, Pd, Ag, Ti, and W as well as Ru. More will be available as they are requested, e.g., Nb is expected in the early fall of 2018.


==Equipment performance and process related parameters==
==Equipment performance and process related parameters==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Temescal"