Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions
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The main purpose of the thermal evaporator is to deposit Al for removing charging of the resist when doing EBL on isolating substrate. | The main purpose of the thermal evaporator is to deposit Al for removing charging of the resist when doing EBL on isolating substrate. | ||
It is not only usable for Al deposition. The thermal evaporator has room for two boats and thereby the possibility to make thin films of two different metals. At the moment not that many metals have been tested and made a recipe for. Right | It is not only usable for Al deposition. The thermal evaporator has room for two boats and thereby the possibility to make thin films of two different metals. At the moment not that many metals have been tested and made a recipe for. Right only Al and Ag can be evaporated. We have also attempted to evaporate Zn but this was not so easy, so it is not a standard process. If you would like to deposit other metals, please talk to the Thin Film group. | ||