Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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!style="background:silver; color:black;" align="center" valign="center" width="80" rowspan="2"|Purpose | !style="background:silver; color:black;" align="center" valign="center" width="80" rowspan="2"|Purpose | ||
|style="background:Whitesmoke; color:black"| Primary | |style="background:Whitesmoke; color:black" width="80 | Primary | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Dry etching of 4" silicon | * Dry etching of 4" silicon | ||