Specific Process Knowledge/Etch/DRIE-Pegasus/TrenchCharacterisation: Difference between revisions
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The numbers and measurements above provide a reasonable good basis for comparing DRIE trenches. They do, however, not take the following aspects into account: | The numbers and measurements above provide a reasonable good basis for comparing DRIE trenches. They do, however, not take the following aspects into account: | ||
* | * '''Complex sidewall profiles''': The numbers give most sense if the profiles are almost straight. The more they deviate, the more nonsense... | ||
** Excessive bowing | |||
** Undercut features | |||
* '''Aspect ratio dependent etching''': Trenches with high aspect ratios typically etch faster in the beginning of the etch process compared to the end because of aspect ratio dependent etching | |||