Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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== General Pegasus information == | == General Pegasus information == | ||
===Wafer bonding=== | |||
To find information on how to bond wafers or chips to a carrier wafer, click [[Specific Process Knowledge/Etch/DryEtchProcessing/Bonding| | To find information on how to bond wafers or chips to a carrier wafer, click [[Specific Process Knowledge/Etch/DryEtchProcessing/Bonding| '''HERE''']]. | ||
===Characterisation of etched trenches=== | |||
Comparing differences in etched trenches requires a set of common parameters for each trench. Click [[Specific Process Knowledge/Etch/DRIE-Pegasus/TrenchCharacterisation| | Comparing differences in etched trenches requires a set of common parameters for each trench. Click [[Specific Process Knowledge/Etch/DRIE-Pegasus/TrenchCharacterisation|'''HERE''']] to find more information about the parameters used on the DRIE-Pegasus process development. | ||
===Material from SPTS=== | |||
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/SPTSdocs|Hardware and process applications]] | *[[Specific Process Knowledge/Etch/DRIE-Pegasus/SPTSdocs|Hardware and process applications]] | ||
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ|Miscellaneous information]] | *[[Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ|Miscellaneous information]] | ||