Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions
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===Changing the Cl2/N2 ratio=== | ===Changing the Cl2/N2 ratio=== | ||
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Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,317 edits |
Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,317 edits |
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===Changing the Cl2/N2 ratio=== | ===Changing the Cl2/N2 ratio=== | ||
<gallery> | |||
Image:S0_oxide_05.jpg | |||
Image:S4_06.jpg | |||
Image:S5_05.jpg | |||
</gallery> | |||