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Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions

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The conclusion was that e-beam evaporation of aluminium in the Alcatel at 15Å/s gave the best result.
The conclusion was that e-beam evaporation of aluminium in the Alcatel at 15Å/s gave the best result.


See details of the study [[/Aluminium deposition on ZEP520A for lift-off|here]]
See details of the study [[/Aluminium deposition on ZEP520A for lift-off|here]].
 
 
==Comparison of roughness and other surface characteristics for different methods of Aluminium deposition==
 
Studies by AFM was performed to examine differences in characteristics of the Al films, deposited with the differnt methods (sputter, e-beam, thermal). See details of the study [[/Comparison of roughness and other surface characteristics for different methods of Aluminium deposition|here]].
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