Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions
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===Etching of an InP piece on SiO2 carrier=== | ===Etching of an InP piece on SiO2 carrier=== | ||
InP piece patterned with SiO2. The piece was etched on top of a Si wafer coated with SiO2 without bonding. The recipe "InP etch" was used. The roughness looks low in the bottom of the etched areas, even in the large open areas. | InP piece patterned with SiO2. The piece was etched on top of a Si wafer coated with SiO2 without bonding. The recipe "InP etch" was used. The roughness looks low in the bottom of the etched areas, even in the large open areas. | ||
<gallery> | <gallery caption="Result of InP etching." widths="500px" heights="400px" perrow="3"> | ||
Image:S4_00.jpg | Image:S4_00.jpg | ||