Specific Process Knowledge/Thin film deposition/Temescal: Difference between revisions
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= | =E Beam Evaporator (Temescal)= | ||
Write a short description of the equipment(s). | Write a short description of the equipment(s). | ||
Revision as of 10:55, 17 May 2018
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E Beam Evaporator (Temescal)
Write a short description of the equipment(s).
The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:
Process information
Link to process pages - e.g. one page for each material
Example:
- Etch of silicon using RIE
- Etch of silicon oxide using RIE
- Etch of silicon nitride using RIE
- Etch of photo resist using RIE
| Equipment | Equipment 1 | Equipment 2 | |
|---|---|---|---|
| Purpose |
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| Performance | Response 1 |
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| Response 2 |
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| Process parameter range | Parameter 1 |
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| Parameter 2 |
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| Substrates | Batch size |
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| Allowed materials |
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