Specific Process Knowledge/Etch/DRIE-Pegasus/System-description: Difference between revisions
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* the gas composition | * the gas composition | ||
* the RF powers | * the RF powers | ||
are changed every few seconds - hence requiring the capacitors to adjust to an entirely new situation. | are changed every few seconds - hence requiring the capacitors to adjust to an entirely new situation. In other words, if not carefully tuned, the Bosch process will spend most of the time stabilizing the plasma. | ||