Specific Process Knowledge/Etch/DRIE-Pegasus/System-description: Difference between revisions
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'''What happens in a Bosch process where the plasma conditions change every few seconds?''' | '''What happens in a Bosch process where the plasma conditions change every few seconds?''' | ||
The situation during a Bosch process as described in the top of this page is very different from the continuous process with respect to RF matching. Here, | The situation during a Bosch process as described in the top of this page is very different from the continuous process with respect to RF matching. Here, | ||
* the pressure | * the pressure | ||
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* the gas composition | * the gas composition | ||
* the RF powers | * the RF powers | ||
are changed every few seconds - hence | are changed every few seconds - hence requiring the capacitors to adjust to an entirely new situation. | ||