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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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The table below shows  
The table below shows  
... The effect of serifs is significant below 2µm, but negligible above 4µm.  
... The effect of corner correction is significant below 2µm, but negligible above 4µm.  


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
Line 38: Line 38:
!
!
!As designed
!As designed
!With OPC (0.5µm corner serifs)
!With OPC (0.5µm corner corrections/serifs)
|-
|-


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