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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,499 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,499 edits
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Design
|'''Design file'''
|[[Image:OPC0 trenches flip ann.jpg|350px]]
|[[Image:OPC0 trenches flip ann.jpg|350px]]
|[[Image:OPC0,5 trenches flip.jpg|350px]]
|[[Image:OPC0,5 trenches flip.jpg|350px]]
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|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|1.5µm AZ 5214E
|'''1.5µm AZ 5214E'''
Dose: 80, defoc: -3
Dose: 80, defoc: -3


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|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|0.5µm AZ 5214E (diluted)
|'''0.5µm AZ 5214E (diluted)'''
Dose: 80, defoc: -3
Dose: 80, defoc: -3


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