Specific Process Knowledge/Etch/Etching of Bulk Glass: Difference between revisions
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*(Poly)Silicon | *(Poly)Silicon | ||
*Silicon Nitride | *Silicon Nitride | ||
*Metals if they cover less than 5% of the wafer area | *Metals if they cover less than 5% of the wafer area | ||
| | | | ||
*Photoresist | *Photoresist | ||