Specific Process Knowledge/Thin film deposition/Deposition of Chromium: Difference between revisions

Revision as of 07:24, 11 August 2008 view source Kn (talk \| contribs) danchip 979 edits No edit summary ← Older edit		Revision as of 09:51, 11 August 2008 view source Kn (talk \| contribs) danchip 979 edits No edit summary Newer edit →
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	[[/Deposition of Chromium\|Uniformity of Cr layers]] - ''Uniformity of Cr layers deposited with different settings''		[[/Deposition of Chromium\|Uniformity of Cr layers]] - ''Uniformity of Cr layers deposited with different settings''

	[[Sputtering of Cr in Wordentec]] - ''~~Sputtering of Cr in Wordentec (settings~~ and rates)''		[[Sputtering of Cr in Wordentec]] - ''Settings and deposition rates''