Specific Process Knowledge/Thin film deposition/Deposition of Chromium: Difference between revisions
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Chromium can be deposited by e-beam evaporation. It should be noted that Chromium does not melt but evaporates directly from the solid phase. In the chart below you can compare the different deposition equipment. | Chromium can be deposited by e-beam evaporation. It should be noted that Chromium does not melt but evaporates directly from the solid phase. Chromium can be sputter deposited aswell. In the chart below you can compare the different deposition equipment. | ||
Revision as of 07:24, 11 August 2008
Chromium can be deposited by e-beam evaporation. It should be noted that Chromium does not melt but evaporates directly from the solid phase. Chromium can be sputter deposited aswell. In the chart below you can compare the different deposition equipment.
E-beam evaporation (Alcatel) | E-beam evaporation (Leybold) | E-beam evaporation (Wordentec) | Sputter deposition (Wordentec) | |
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Batch size |
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|
|
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Pre-clean | RF Ar clean | Ar ion bombartment | RF Ar clean | RF Ar clean |
Layer thickness | 10Å to 1µm | 10Å to 0.5µm | 10Å to 1µm | . |
Deposition rate | 2Å/s to 15Å/s | 1Å/s to 5Å/s | 10Å/s to 15Å/s | . |
Studies of Cr deposition processes
Uniformity of Cr layers - Uniformity of Cr layers deposited with different settings
Sputtering of Cr in Wordentec - Sputtering of Cr in Wordentec (settings and rates)